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More Lithography/Mask Challenges (part 1)
Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at Imec; Harry Levinson, senior fellow and...
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Extreme Quality Semiconductor Manufacturing
By Ben Tsai and Cathy Perry Sullivan Across the full range of semiconductor device types and design nodes, there is a drive to produce chips with significantly higher quality. Automotive, IoT and other...
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Finding, Predicting EUV Stochastic Defects
Several vendors are rolling out next-generation inspection systems and software that locates problematic defects in chips caused by processes in extreme ultraviolet (EUV) lithography. Each defect...
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Gearing Up For High-NA EUV
The semiconductor industry is moving full speed ahead to develop high-NA EUV, but bringing up this next generation lithography system and the associated infrastructure remains a monumental and...
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Strategies For Faster Yield Ramps On 5nm Chips
Leading chipmakers TSMC and Samsung are producing 5nm devices in high volume production and TSMC is forging ahead with plans for first 3nm silicon by year end. But to meet such aggressive targets,...
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New research paper entitled “Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement” from TEL Technology Center, Americas and IBM...
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Shortages Spark Novel Component Lifecycle Solutions
The semiconductor industry’s supply chain problems are prompting some innovative solutions and workarounds, and while they don’t solve all problems, they are improving efficiency and extending...
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Variation Making Trouble In Advanced Packages
Variation is becoming increasingly problematic as chip designs become more heterogeneous and targeted by application, making it difficult to identify the root cause of problems or predict what can go...
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Challenges Grow For CD-SEMs At 5nm And Beyond
CD-SEM, the workhorse metrology tool used by fabs for process control, is facing big challenges at 5nm and below. Traditionally, CD-SEM imaging has relied on a limited number of image frames for...
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